Invention Grant
- Patent Title: SiC single crystal and method of producing same
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Application No.: US14128834Application Date: 2011-08-02
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Publication No.: US10094041B2Publication Date: 2018-10-09
- Inventor: Katsunori Danno
- Applicant: Katsunori Danno
- Applicant Address: JP Toyota-shi, Aichi-ken
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota-shi, Aichi-ken
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: JP2011-148388 20110704
- International Application: PCT/JP2011/068016 WO 20110802
- International Announcement: WO2013/005347 WO 20130110
- Main IPC: C30B11/14
- IPC: C30B11/14 ; C30B29/36 ; C30B9/06

Abstract:
A SiC single crystal having high crystallinity and a large diameter is provided.A SiC single crystal comprising a seed crystal with a c-plane and a non-c-plane, and a c-plane growth portion and an enlarged diameter portion that have grown from the c-plane and the non-c-plane of the seed crystal as origins in the direction of the c-plane and the direction of the non-c-plane,wherein a continuous region free of threading dislocations is present in a peripheral portion of a plane that is parallel to the c-plane of the seed crystal, and contains the seed crystal and the enlarged diameter portion, wherein the area of the continuous region occupies 50% or more of the total area of the plane.
Public/Granted literature
- US20140127466A1 SIC SINGLE CRYSTAL AND METHOD OF PRODUCING SAME Public/Granted day:2014-05-08
Information query
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