Invention Grant
- Patent Title: Method for producing single crystal with reduced number of crystal defects
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Application No.: US15506478Application Date: 2015-08-25
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Publication No.: US10094043B2Publication Date: 2018-10-09
- Inventor: Shou Takashima , Yuuichi Miyahara , Atsushi Iwasaki
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-186166 20140912
- International Application: PCT/JP2015/004258 WO 20150825
- International Announcement: WO2016/038817 WO 20160317
- Main IPC: C30B15/22
- IPC: C30B15/22 ; C30B29/06

Abstract:
A method for producing a single crystal, wherein the space is adjusted to a predetermined distance by measuring a distance from a reference height position at a predetermined height above a melt surface to a lower end part of an in-furnace structure in a state wherein the in-furnace structure above the melt surface is installed in a pull chamber, obtaining a lower end part position error which is a difference between measured distance and a distance from the previously set reference height position to the lower end part of the in-furnace structure, obtaining a target distance from the melt surface to the reference height position by adding the lower end part position error and a distance from the reference height position to a melt surface position, and adjusting a distance from an initial position of the melt surface to the reference height position such that the target distance is attained.
Public/Granted literature
- US20170260646A1 METHOD FOR PRODUCING SINGLE CRYSTAL Public/Granted day:2017-09-14
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