Invention Grant
- Patent Title: Wafer producing method
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Application No.: US15099044Application Date: 2016-04-14
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Publication No.: US10094047B2Publication Date: 2018-10-09
- Inventor: Kazuya Hirata
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2015-083643 20150415
- Main IPC: B29C35/08
- IPC: B29C35/08 ; C30B33/02 ; C30B29/40 ; B28D1/22 ; H01L21/02 ; B23K26/00 ; B23K26/08 ; B23K26/0622 ; B23K26/53 ; B24B7/22 ; B23K101/40

Abstract:
A wafer is produced from a compound single crystal ingot having end surface. A separation plane is formed by setting the focal point of a laser beam inside the ingot at a predetermined depth from the end surface. The depth corresponds to the thickness of the wafer to be produced. The laser beam is applied to the end surface to form a modified layer parallel to the end surface and cracks extending from the modified layer, thus forming the separation plane. The ingot has first atoms having a larger atomic weight and second atoms having a smaller atomic weight, and the end surface of the ingot is set as a polar plane where the second atoms are arranged in forming the separation plane. After producing the wafer from the ingot, the first end surface is ground to be flattened.
Public/Granted literature
- US20160305042A1 WAFER PRODUCING METHOD Public/Granted day:2016-10-20
Information query
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