Invention Grant
- Patent Title: Optical field enhancement device and manufacturing method of the same
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Application No.: US14849932Application Date: 2015-09-10
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Publication No.: US10094956B2Publication Date: 2018-10-09
- Inventor: Shogo Yamazoe
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2013-066604 20130327
- Main IPC: G02F1/03
- IPC: G02F1/03 ; G02B26/00 ; B05D5/00 ; B32B9/00 ; G02B5/00 ; B82Y20/00 ; G01N21/552 ; B82Y30/00 ; B82Y40/00

Abstract:
In an optical field enhancement device in which localized plasmon is induced on a surface through illumination of excitation light and intensity of signal light emitted, by the illumination, from a sample placed on the surface is enhanced, forming sharp-edged petal-like fine uneven structures disposed at random on a substrate, and forming plate-like metal fine structures on tip portions of the sharp-edged petal-like fine uneven structures by depositing a metal from an oblique direction with respect to a direction perpendicular to a plane of the substrate on which the sharp-edged petal-like fine uneven structures are formed.
Public/Granted literature
- US20160003988A1 OPTICAL FIELD ENHANCEMENT DEVICE AND MANUFACTURING METHOD OF THE SAME Public/Granted day:2016-01-07
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