Invention Grant
- Patent Title: Photosensitive composition and pattern formation method
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Application No.: US15446531Application Date: 2017-03-01
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Publication No.: US10095108B2Publication Date: 2018-10-09
- Inventor: Minoru Toriumi , Toshiro Itani
- Applicant: Evolving nano process Infrastructure Development Center, Inc.
- Applicant Address: JP Tsukuba-shi
- Assignee: Evolving nano process Infrastructure Development Center, Inc.
- Current Assignee: Evolving nano process Infrastructure Development Center, Inc.
- Current Assignee Address: JP Tsukuba-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-059026 20160323
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/16 ; G03F7/32 ; G03F7/20 ; G03F7/09 ; C01G23/047 ; H01L21/027 ; C01G27/00 ; C01G25/02 ; G03F7/039 ; B82Y30/00
Abstract:
According to one embodiment, a photosensitive composition includes a great number of photosensitive core-shell type nano-particles each including a core and a shell and having a structure that the core is metal oxide particle and covered by the shell. The shell includes a) unsaturated carboxylic acid or unsaturated carboxylate, which is a negatively ionized unsaturated carboxylic acid, and b) silylated unsaturated carboxylic acid or unsaturated carboxylate which is negatively ionized silylated unsaturated carboxylic acid.
Public/Granted literature
- US20170277036A1 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMATION METHOD Public/Granted day:2017-09-28
Information query
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