Invention Grant
- Patent Title: Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program
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Application No.: US15129380Application Date: 2015-04-01
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Publication No.: US10095123B2Publication Date: 2018-10-09
- Inventor: Marinus Maria Johannes Van De Wal , Wilhelmus Henricus Theodorus Maria Aangenent , Jeroen Johannes Theodorus Hendrikus De Best , Jan Van Eijk
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14163509 20140404
- International Application: PCT/EP2015/057199 WO 20150401
- International Announcement: WO2015/150466 WO 20151008
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03F7/20
Abstract:
A control system for a positioning system, for positioning a driven object, e.g. in a lithographic apparatus, in N dimensions has M sensors, where M>N. A transformation module converts the M measurements by the sensors into a positional estimate in N dimensions taking into account compliance of the driven object.
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