Invention Grant
- Patent Title: Wafer processing method
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Application No.: US15434311Application Date: 2017-02-16
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Publication No.: US10096517B2Publication Date: 2018-10-09
- Inventor: Tomoki Yoshino , Takumi Shotokuji
- Applicant: DISCO CORPORATION
- Applicant Address: JP Tokyo
- Assignee: Disco Corporation
- Current Assignee: Disco Corporation
- Current Assignee Address: JP Tokyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JP2016-028673 20160218
- Main IPC: H01L21/78
- IPC: H01L21/78 ; H01L21/268 ; H01L21/304 ; H01L21/683 ; H01L21/67

Abstract:
Disclosed herein is a wafer processing method for dividing a wafer into individual device chips along division lines. The wafer processing method includes a frame supporting step of attaching the wafer to an adhesive tape fixed at its peripheral portion to an annular frame, thereby supporting the wafer through the adhesive tape to the annular frame, a laser processing step of applying a laser beam to each division line to thereby form a strength reduced portion along each division line, and a dividing step of applying a radial tension to the adhesive tape and next applying an external force to the wafer in the condition where the radial tension is kept acting on the adhesive tape, thereby dividing the wafer into the individual device chips along the division lines.
Public/Granted literature
- US20170243786A1 WAFER PROCESSING METHOD Public/Granted day:2017-08-24
Information query
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