Invention Grant
- Patent Title: Method of utilizing trench silicide in a gate cross-couple construct
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Application No.: US15167347Application Date: 2016-05-27
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Publication No.: US10103066B2Publication Date: 2018-10-16
- Inventor: Ryan Ryoung-han Kim
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES INC.
- Current Assignee: GLOBALFOUNDRIES INC.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L21/8238
- IPC: H01L21/8238 ; H01L29/66 ; H01L27/118 ; H01L27/02 ; H01L27/092 ; H01L23/535 ; H01L27/088 ; H01L21/8234

Abstract:
A method of forming a logic cell utilizing a TS gate cross-couple construct and the resulting device are provided. Embodiments include forming active fins and dummy fins on a substrate, the dummy fins adjacent to each other and between the active fins; forming STI regions between and next to the active and dummy fins; forming gate structures in parallel across the active and dummy fins; forming a gate cut region by cutting the gate structures between the dummy fins; forming a TS layer between the gate structures, the TS layer crossing the gate cut region; and forming a contact connecting a gate structure and the TS layer on a first side of the gate cut region and forming a contact connecting a gate structure and the TS layer on a second side of the gate cut region, the TS layer and contacts cross coupling the gate structures.
Public/Granted literature
- US20160293495A1 METHOD OF UTILIZING TRENCH SILICIDE IN A GATE CROSS-COUPLE CONSTRUCT Public/Granted day:2016-10-06
Information query
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