Invention Grant
- Patent Title: Resistive switching random access memory with asymmetric source and drain
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Application No.: US15292964Application Date: 2016-10-13
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Publication No.: US10103200B2Publication Date: 2018-10-16
- Inventor: Chin-Chieh Yang , Hsia-Wei Chen , Chih-Yang Chang , Kuo-Chi Tu , Wen-Ting Chu , Yu-Wen Liao
- Applicant: Taiwan Semiconductor Manufacturing Company., Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L27/24
- IPC: H01L27/24 ; H01L29/66 ; H01L45/00 ; H01L21/265 ; H01L21/266 ; H01L29/08 ; H01L29/78

Abstract:
A resistive random access memory (RRAM) structure includes a resistive memory element formed on a semiconductor substrate and designed for data storage. The resistive element includes a resistive material layer. The resistive element further includes first and second electrodes interposed by the resistive material layer. The resistive element further includes a field effect transistor (FET) formed on the semiconductor substrate and coupled with the resistive memory element, wherein the FET includes asymmetric source and drain, the drain having a higher doping concentration than the source. The resistive memory element is coupled with the drain.
Public/Granted literature
- US20170033159A1 Resistive Switching Random Access Memory with Asymmetric Source and Drain Public/Granted day:2017-02-02
Information query
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