Invention Grant
- Patent Title: Semiconductor device having a super junction structure
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Application No.: US15461018Application Date: 2017-03-16
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Publication No.: US10103228B2Publication Date: 2018-10-16
- Inventor: Yusuke Kubo
- Applicant: ROHM CO., LTD.
- Applicant Address: JP Kyoto
- Assignee: ROHM CO., LTD.
- Current Assignee: ROHM CO., LTD.
- Current Assignee Address: JP Kyoto
- Agency: Hamre, Schumann, Mueller & Larson, P.C.
- Priority: JP2016-066392 20160329
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L31/00 ; H01L29/10 ; H01L29/78 ; H01L29/66 ; H01L29/739 ; H01L29/167 ; H01L21/263 ; H01L21/268

Abstract:
A semiconductor device includes a semiconductor layer, having a drain region, a body region, and a source region, a gate electrode, facing the body region via a gate insulating film, a first pillar layer disposed inside the semiconductor layer so as to be continuous to the body region, and a trap level region, disposed inside the semiconductor layer and containing charged particles that form a trap level, and an electric field concentration portion, where an electric field concentrates in an off state in which a channel is not formed in the body region, and the trap level region are disposed at mutually different depth positions in a depth direction of the first pillar layer.
Public/Granted literature
- US20170288021A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-10-05
Information query
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