Invention Grant
- Patent Title: Method and apparatus for stressing a non-volatile memory
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Application No.: US14631365Application Date: 2015-02-25
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Publication No.: US10109356B2Publication Date: 2018-10-23
- Inventor: Chen He , Richard K. Eguchi , Fuchen Mu , Benjamin A. Schmid , Craig T. Swift , Yanzhuo Wang
- Applicant: FREESCALE SEMICONDUCTOR, INC.
- Applicant Address: US TX Austin
- Assignee: NXP USA, INC.
- Current Assignee: NXP USA, INC.
- Current Assignee Address: US TX Austin
- Main IPC: G11C16/14
- IPC: G11C16/14 ; G11C29/02 ; G11C29/06 ; G11C16/04 ; G11C29/50

Abstract:
A method and memory for stressing a plurality of non-volatile memory cells is provided. The method includes entering a memory cell stressing mode and providing one or more erase stress pulses to the plurality of non-volatile memory cells; determining that a threshold voltage of at least a subset of the plurality of non-volatile memory cells has a first relationship that is either greater than or less than a first predetermined voltage; providing one or more program stress pulses to the plurality of memory cells; and determining that the threshold voltage of at least a subset of the plurality of memory cells has a second relationship to a second predetermined voltage that is different than the first relationship.
Public/Granted literature
- US20160247574A1 METHOD AND APPARATUS FOR STRESSING A NON-VOLATILE MEMORY Public/Granted day:2016-08-25
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