Invention Grant
- Patent Title: Process to improve coverage and electrical performance of solid electrolytic capacitors
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Application No.: US15672000Application Date: 2017-08-08
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Publication No.: US10109428B2Publication Date: 2018-10-23
- Inventor: Yaru Shi , Antony P. Chacko , Hong Zhang , Qingping Chen , Lei Xu , Yang Jin , Zhen Wu
- Applicant: KEMET Electronics Corporation
- Applicant Address: US SC Simpsonville
- Assignee: KEMET Electronics Corporation
- Current Assignee: KEMET Electronics Corporation
- Current Assignee Address: US SC Simpsonville
- Agency: Patent Filing Specialist, Inc.
- Agent Joseph T. Guy
- Main IPC: H01G9/042
- IPC: H01G9/042 ; H01G9/15 ; C09D5/24 ; H01G9/00 ; H01G9/012 ; H01G9/07 ; H01G9/025 ; H01G9/028 ; H01G9/052
Abstract:
A method for forming a capacitor, a capacitor formed thereby and an improved composition for a conductive coating are described. The method includes providing an anode, forming a dielectric on the anode and forming a cathode layer over the dielectric by applying a monoamine, a weak acid and a conductive polymer.
Public/Granted literature
- US20170338048A1 Process to Improve Coverage and Electrical Performance of Solid Electrolytic Capacitors Public/Granted day:2017-11-23
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