Invention Grant
- Patent Title: Charge storage region in non-volatile memory
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Application No.: US15893157Application Date: 2018-02-09
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Publication No.: US10115737B2Publication Date: 2018-10-30
- Inventor: Hoon Cho , Jun Wan , Ching-Huang Lu
- Applicant: SanDisk Technologies LLC
- Applicant Address: US TX Addison
- Assignee: SanDisk Technologies LLC
- Current Assignee: SanDisk Technologies LLC
- Current Assignee Address: US TX Addison
- Agency: Vierra Magen Marcus LLP
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L29/792 ; H01L29/788 ; H01L29/423 ; H01L29/40 ; H01L27/11556 ; H01L21/28

Abstract:
Disclosed herein is a non-volatile storage system with memory cells having a charge storage region that may be configured to store a higher density of charges (e.g., electrons) in the middle than nearer to the control gate or channel. The charge storage region has a middle charge storage material that stores a higher density of charges than two outer charge storage materials that are nearer to the control gate or channel, in one aspect. The charge storage region of one aspect has oxide regions between the middle charge storage material and the two outer charge storage materials. The oxide regions of one embodiment are thin (e.g., less than one nanometer) such that during operation charges may easily pass through the oxide regions. The non-volatile memory cell programs quickly and has high data retention.
Public/Granted literature
- US20180166463A1 CHARGE STORAGE REGION IN NON-VOLATILE MEMORY Public/Granted day:2018-06-14
Information query
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