The present disclosure relates to an array substrate and the manufacturing method thereof. The manufacturing method includes depositing a conductive layer on a substrate, forming three poles of at least one thin film transistor (TFT), a first signal line, and a second signal line by etching the conductive layer via a first mask, The method also includes depositing an intermediate layer in sequence, forming a first connecting bridge connecting a first portion and a second portion by etching the intermediate layer via a second mask, depositing a conductive electrode, and forming at least one pixel electrode and a connecting line between the first portion and the second portion by etching the conductive electrode via a third mask. In this way, the time of the manufacturing process of the array substrates may be reduced such that the manufacturing cost may be decreased.