Invention Grant
- Patent Title: Semiconductor device
-
Application No.: US15248701Application Date: 2016-08-26
-
Publication No.: US10128196B2Publication Date: 2018-11-13
- Inventor: Takashi Ushijima
- Applicant: Toyota Jidosha Kabushiki Kaisha
- Applicant Address: JP Toyota-shi
- Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee: Toyota Jidosha Kabushiki Kaisha
- Current Assignee Address: JP Toyota-shi
- Agency: Dinsmore & Shohl LLP
- Priority: JP2015-171390 20150831
- Main IPC: H01L23/535
- IPC: H01L23/535 ; H01L23/528 ; H01L23/00 ; H01L23/522 ; H01L23/051 ; H01L23/433 ; H01L29/417 ; H01L29/45

Abstract:
A semiconductor device including: a semiconductor substrate a semiconductor element is formed; a first electrode layer stacked on the semiconductor substrate and connected to the semiconductor element; a first insulation film stacked on an upper face of the first electrode layer; and a second electrode layer stacked over the first electrode layer and the first insulation film, the second electrode layer including a material having a mechanical strength that is higher than a mechanical strength of a material included in the first electrode layer; wherein a groove portion is provided from the upper face in a direction toward a lower face of the first electrode layer, a protrusion portion protruding into the groove portion is provided on a lower face of the second electrode layer, and a lower end of the protrusion portion is positioned below the center position in a thickness direction of the first electrode layer.
Public/Granted literature
- US20170062340A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-03-02
Information query
IPC分类: