Invention Grant
- Patent Title: Semiconductor devices including active areas with increased contact area
-
Application No.: US15473031Application Date: 2017-03-29
-
Publication No.: US10128245B2Publication Date: 2018-11-13
- Inventor: Do Sun Lee , Joon Gon Lee , Na Rae Kim , Chul Sung Kim , Do Hyun Lee , Ryuji Tomita , Sang Jin Hyun
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel, P.A.
- Priority: KR10-2016-0122222 20160923
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L27/092 ; H01L29/165 ; H01L29/45 ; H01L29/417 ; H01L21/8238 ; H01L29/08 ; H01L29/66 ; H01L21/02 ; H01L21/285

Abstract:
Semiconductor devices may have a first semiconductor element including first active regions that are doped with a first conductivity-type impurity and that are on a semiconductor substrate, a first gate structure between the first active regions, and first contacts connected to the first active regions, respectively; and a second semiconductor element including second active regions that are doped with a second conductivity-type impurity different from the first conductivity-type impurity and that are on the semiconductor substrate, a second gate structure between the second active regions, and second contacts connected to the second active regions, respectively, and having a second length greater than a first length of each of the first contacts in a first direction parallel to an upper surface of the semiconductor substrate.
Public/Granted literature
- US20180090495A1 Semiconductor Devices Including Active Areas with Increased Contact Area Public/Granted day:2018-03-29
Information query
IPC分类: