Invention Grant
- Patent Title: Light absorption apparatus
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Application No.: US15652187Application Date: 2017-07-17
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Publication No.: US10128303B2Publication Date: 2018-11-13
- Inventor: Szu-Lin Cheng , Han-Din Liu , Shu-Lu Chen
- Applicant: Artilux Inc.
- Applicant Address: TW Zhubei, Hsinchu County
- Assignee: Artilux Inc.
- Current Assignee: Artilux Inc.
- Current Assignee Address: TW Zhubei, Hsinchu County
- Agency: Perkins Coie LLP
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H01L31/0216 ; H01L31/0224 ; H01L31/028 ; H01L31/036 ; H01L31/105 ; H01L31/18

Abstract:
A light absorption apparatus includes a substrate, a light absorption layer above the substrate on a first selected area, a silicon layer above the light absorption layer, a spacer surrounding at least part of the sidewall of the light absorption layer, an isolation layer surrounding at least part of the spacer, wherein the light absorption apparatus can achieve high bandwidth and low dark current.
Public/Granted literature
- US20170317135A1 LIGHT ABSORPTION APPARATUS Public/Granted day:2017-11-02
Information query
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