Invention Grant
- Patent Title: Method of manufacturing display device
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Application No.: US15605086Application Date: 2017-05-25
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Publication No.: US10128402B2Publication Date: 2018-11-13
- Inventor: Akio Yamashita , Yumiko Fukumoto , Yuugo Goto
- Applicant: Semiconductor Energyy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office
- Agent Eric J. Robinson
- Priority: JP2003-399926 20031128
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L27/15 ; G02F1/1333 ; H01L51/52 ; H01L51/00 ; H01L27/12 ; H01L27/32 ; H01L51/56

Abstract:
To provide a method of manufacturing a display device having an excellent impact resistance property with high yield, in particular, a method of manufacturing a display device having an optical film that is formed using a plastic substrate. The method of manufacturing a display device includes the steps of: laminating a metal film, an oxide film, and an optical filter on a first substrate; separating the optical filter from the first substrate; attaching the optical filter to a second substrate; forming a layer including a pixel on a third substrate; and attaching the layer including the pixel to the optical filter.
Public/Granted literature
- US20170263806A1 METHOD OF MANUFACTURING DISPLAY DEVICE Public/Granted day:2017-09-14
Information query
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