Invention Grant
- Patent Title: Apparatus and method for cutting a wafer that is substantially covered by an opaque material
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Application No.: US15048201Application Date: 2016-02-19
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Publication No.: US10134650B2Publication Date: 2018-11-20
- Inventor: Guido Knippels , Geert Ubink , Jianfei Yang , Eric Meng Meng Tan , Marcel Boeren
- Applicant: ASM Technology Singapore Pte Ltd
- Applicant Address: SG Singapore
- Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
- Current Assignee: ASM TECHNOLOGY SINGAPORE PTE LTD
- Current Assignee Address: SG Singapore
- Agency: Ostrolenk Faber LLP
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/66 ; G05B19/418 ; H01L21/67 ; H01L21/68 ; H01L21/78 ; H01L23/544

Abstract:
A wafer cutting apparatus comprises a wafer positioning device for holding a wafer that is substantially covered with an opaque material such as molding compound and that has an exposed peripheral area, and for displacing the wafer relative to a wafer inspection system comprising a camera having a field of view. To perform visual data acquisition of said dicing street portions, the wafer is displaced such that a center of the camera's field of view follows a path along the exposed peripheral area of the wafer. A processing unit analyzes the visual data acquired for detecting or calculating locations and directions of the dicing streets. A wafer cutting tool cuts the wafer along straight lines between the dicing street portions which have been detected or calculated by the processing unit.
Public/Granted literature
- US20170243796A1 APPARATUS AND METHOD FOR CUTTING A WAFER THAT IS SUBSTANTIALLY COVERED BY AN OPAQUE MATERIAL Public/Granted day:2017-08-24
Information query
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