Invention Grant
- Patent Title: Bonding method for connecting two wafers
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Application No.: US15429669Application Date: 2017-02-10
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Publication No.: US10134707B2Publication Date: 2018-11-20
- Inventor: Kai Zoschke , Michael Töpper
- Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Applicant Address: DE München
- Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Current Assignee: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
- Current Assignee Address: DE München
- Agency: Schwegman Lundberg & Woessner, P.A.
- Priority: DE102016202174 20160212
- Main IPC: B32B3/02
- IPC: B32B3/02 ; H01L23/00 ; B32B7/14 ; B32B37/12

Abstract:
The present invention relates to a bonding method for connecting a first wafer and a second wafer, wherein firstly a first adhesive layer is deposited onto a surface of the first wafer. Furthermore, a second adhesive layer is deposited onto the first adhesive layer, and the two adhesive layers are structured by way of selective removal of both adhesive layers in at least one predefined region of the first wafer, Moreover, the first wafer is connected to the second wafer by way of pressing a surface of the second wafer onto the second adhesive layer, wherein the second adhesive layer is more flowable that the first adhesive layer on connecting the first wafer to the second wafer.
Public/Granted literature
- US20170236799A1 BONDING METHOD FOR CONNECTING TWO WAFERS Public/Granted day:2017-08-17
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