Invention Grant
- Patent Title: Nonvolatile resistive switching memory device and manufacturing method thereof
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Application No.: US15546212Application Date: 2015-05-14
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Publication No.: US10134983B2Publication Date: 2018-11-20
- Inventor: Qi Liu , Ming Liu , Haitao Sun , Keke Zhang , Shibing Long , Hangbing Lv , Writam Banerjee , Kangwei Zhang
- Applicant: Institute of Microelectronics, Chinese Academy of Sciences
- Applicant Address: CN Beijing
- Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee: INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES
- Current Assignee Address: CN Beijing
- Agency: K&L Gates LLP
- Priority: CN201510061926 20150205
- International Application: PCT/CN2015/079006 WO 20150514
- International Announcement: WO2016/123882 WO 20160811
- Main IPC: H01L45/00
- IPC: H01L45/00

Abstract:
A nonvolatile resistive switching memory, comprising an inert metal electrode, a resistive switching functional layer, and an easily oxidizable metal electrode, and characterized in that: a graphene barrier layer is inserted between the inert metal electrode and the resistive switching functional layer, which is capable of preventing the easily oxidizable metal ions from migrating into the inert metal electrode through the resistive switching functional layer under the action of electric field during the programming of the device. The manufacturing method therefore comprises adding a monolayer or multilayer graphene thin film between the inert electrode and the solid-state electrolyte resistive switching functional layer which services as a metal ion barrier layer to stop electrically-conductive metal filaments formed in the resistive switching layer from diffusing into the inert electrode layer during a RRAM device programming process, eliminating erroneous programming phenomenon occurring during the erasing process, improving device reliability.
Public/Granted literature
- US20180026183A1 NONVOLATILE RESISTIVE SWITCHING MEMORY DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2018-01-25
Information query
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