Invention Grant
- Patent Title: Semiconductor device
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Application No.: US15460722Application Date: 2017-03-16
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Publication No.: US10141455B2Publication Date: 2018-11-27
- Inventor: Tsuneo Ogura , Shinichiro Misu , Tomoko Matsudai , Norio Yasuhara
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: White & Case LLP
- Priority: JP2014-053320 20140317; JP2015-052706 20150316
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L29/868 ; H01L21/762 ; H01L29/08 ; H01L29/06 ; H01L29/40 ; H01L21/765 ; H01L27/06 ; H01L29/739 ; H01L29/872

Abstract:
According to one embodiment, a semiconductor device includes a first electrode, a second electrode, a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type, an insulating region, and a third semiconductor region of the first conductivity type. The first semiconductor region is provided between the first electrode and the second electrode, and is in contact with the first electrode. The second semiconductor region is provided between the first semiconductor region and the second electrode. The second semiconductor region is in contact with the second electrode. The insulating region extends in a direction from the second electrode toward the first semiconductor region. The insulating region is in contact with the second electrode. The third semiconductor region is provided between the second semiconductor region and the insulating region.
Public/Granted literature
- US20170186884A1 SEMICONDUCTOR DEVICE Public/Granted day:2017-06-29
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