Invention Grant
- Patent Title: Laser processing system for monitoring impure gas in laser optical path
-
Application No.: US15266020Application Date: 2016-09-15
-
Publication No.: US10145829B2Publication Date: 2018-12-04
- Inventor: Takashi Izumi
- Applicant: FANUC CORPORATION
- Applicant Address: JP Yamanashi
- Assignee: FANUC CORPORATION
- Current Assignee: FANUC CORPORATION
- Current Assignee Address: JP Yamanashi
- Agency: RatnerPrestia
- Priority: JP2015-184455 20150917
- Main IPC: B23K26/00
- IPC: B23K26/00 ; G01N33/00 ; B23K26/142 ; B23K26/14 ; B23K26/70 ; H01S3/00 ; B23K26/12

Abstract:
A laser processing system herein includes a laser oscillator, a laser optical path that guides laser beam from the laser oscillator to a workpiece, a purge gas supply line for supplying a purge gas into the laser optical path, oxygen sensor and an impure gas sensor which detects an impure gas influencing the propagation of the laser beam that are installed in the laser optical path, and an impure gas sensor output value correction unit. The impure gas sensor output value correction unit corrects an output value of the impure gas sensor based on an output value of the oxygen sensor.
Public/Granted literature
- US20170082587A1 LASER PROCESSING SYSTEM FOR MONITORING IMPURE GAS IN LASER OPTICAL PATH Public/Granted day:2017-03-23
Information query