Invention Grant
- Patent Title: Optical assembly, projection system, metrology system and EUV lithography apparatus
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Application No.: US15291631Application Date: 2016-10-12
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Publication No.: US10146048B2Publication Date: 2018-12-04
- Inventor: Michael Brehm , Wolfgang Merkel , Ulrich Weber , Henry Wegert
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: CARL ZEISS SMT GMBH
- Current Assignee: CARL ZEISS SMT GMBH
- Current Assignee Address: DE Oberkochen
- Agency: Edell, Shapiro & Finnan, LLC
- Priority: DE102015219671 20151012
- Main IPC: G02B27/00
- IPC: G02B27/00 ; G02B5/08 ; G02B7/182 ; G02B17/06 ; G03F7/20

Abstract:
An optical assembly (1) includes an optical element (2), a mount (3) configured to hold the optical element (2), and a plurality of fastening elements (12) with fastening areas (14) configured to fasten the optical element (2) to the mount (3). The fastening elements (12) bridge an interstice (11) between the optical element (2) and the mount (3), and a purge device (15) produces at least one purge gas flow (16) in the region of the optical element (2) such that the purge gas flow flows around the fastening areas (14) of the fastening elements (12).
Public/Granted literature
- US20170102539A1 OPTICAL ASSEMBLY, PROJECTION SYSTEM, METROLOGY SYSTEM AND EUV LITHOGRAPHY APPARATUS Public/Granted day:2017-04-13
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