Invention Grant
- Patent Title: Patterned material layer and patterning method
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Application No.: US14861933Application Date: 2015-09-22
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Publication No.: US10153263B2Publication Date: 2018-12-11
- Inventor: Chin-Cheng Yang , Chia-Hua Lin , Chih-Hao Huang
- Applicant: MACRONIX International Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: MACRONIX International Co., Ltd.
- Current Assignee: MACRONIX International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: J.C. Patents
- Main IPC: H01L27/02
- IPC: H01L27/02 ; H01L29/06 ; G06F17/50

Abstract:
A structure of a patterned material layer including separate patterns arranged in rows and columns is described. The separate patterns in at least one row including the outmost row each have a larger dimension in the column direction than the separate patterns in the other rows. The separate patterns in at least one column including the outmost column each have a larger dimension in the row direction than the separate patterns in the other columns.
Public/Granted literature
- US20170084597A1 PATTERNED MATERIAL LAYER AND PATTERNING METHOD Public/Granted day:2017-03-23
Information query
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