Invention Grant
- Patent Title: SRAM cells with vertical gate-all-round MOSFETs
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Application No.: US15604121Application Date: 2017-05-24
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Publication No.: US10153286B2Publication Date: 2018-12-11
- Inventor: Jhon Jhy Liaw
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater Matsil, LLP
- Main IPC: H01L27/11
- IPC: H01L27/11 ; H01L29/417 ; H01L23/528 ; H01L29/06 ; H01L29/78 ; H01L29/786 ; G11C11/417

Abstract:
A Static Random Access Memory (SRAM) cell includes a first and a second pull-up transistor, a first and a second pull-down transistor forming cross-latched inverters with the first and the second pull-up transistors, and a first and a second pass-gate transistor. Each of the first and the second pull-up transistors, the first and the second pull-down transistors, and the first and the second pass-gate transistors includes a bottom plate as a first source/drain region, a channel over the bottom plate, and a top plate as a second source/drain region. A first isolated active region is in the SRAM cell and acts as the bottom plate of the first pull-down transistor and the bottom plate of the first pass-gate transistor. A second isolated active region is in the SRAM cell and acts as the bottom plate of the second pull-down transistor and the bottom plate of the second pass-gate transistor.
Public/Granted literature
- US20170256550A1 SRAM Cells with Vertical Gate-All-Round MOSFETS Public/Granted day:2017-09-07
Information query
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