Invention Grant
- Patent Title: Method and structure for nanoimprint lithography masks using optical film coatings
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Application No.: US15259769Application Date: 2016-09-08
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Publication No.: US10156786B2Publication Date: 2018-12-18
- Inventor: Thomas E. Seidel
- Applicant: Thomas E. Seidel
- Agency: Ascenda Law Group, PC
- Main IPC: B29C43/00
- IPC: B29C43/00 ; G03F7/00 ; B29C59/02 ; B29C59/00
Abstract:
Structures and associated methods for making high index of refraction surface coatings for masks used in imprint lithography for application to patterning for advanced semiconductor and data storage devices.
Public/Granted literature
- US20170090282A1 METHOD AND STRUCTURE FOR NANOIMPRINT LITHOGRAPHY MASKS USING OPTICAL FILM COATINGS Public/Granted day:2017-03-30
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