Invention Grant
- Patent Title: Chemical liquid treatment apparatus and chemical liquid treatment method
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Application No.: US14466391Application Date: 2014-08-22
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Publication No.: US10157756B2Publication Date: 2018-12-18
- Inventor: Hiroaki Yamada , Yoshihiro Ogawa , Takeshi Hizawa
- Applicant: TOSHIBA MEMORY CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee: TOSHIBA MEMORY CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2014-005859 20140116
- Main IPC: H01L21/67
- IPC: H01L21/67 ; B08B3/14 ; C23F1/26 ; H01L21/66 ; H01L21/311
Abstract:
A chemical liquid treatment apparatus includes processing chambers; a chemical liquid feeding unit configured to cyclically feed a chemical liquid into the processing chambers; and a modifying unit. The modifying unit, when using a chemical liquid in which an effect thereof varies with a chemical liquid discharge time, is configured to calculate a variation of the effect of the chemical liquid based on the chemical liquid discharge time and is configured to modify the chemical liquid discharge time for each of the processing chambers based on the calculated variation of the effect of the chemical liquid and a cumulative time of the chemical liquid discharge time.
Public/Granted literature
- US20150200116A1 CHEMICAL LIQUID TREATMENT APPARATUS AND CHEMICAL LIQUID TREATMENT METHOD Public/Granted day:2015-07-16
Information query
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