Invention Grant
- Patent Title: Systems and methods for protecting a semiconductor device
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Application No.: US15226995Application Date: 2016-08-03
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Publication No.: US10157906B2Publication Date: 2018-12-18
- Inventor: Kuo-Yu Chou , Shang-Fu Yeh , Yi-Ping Chao , Chih-Lin Lee
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: Jones Day
- Main IPC: H01L27/02
- IPC: H01L27/02
Abstract:
Circuits and methods for protecting a device are provided. A first device to be protected includes a gate dielectric of a first thickness. A second device includes a gate dielectric of a second thickness that is less than the first thickness. A gate is shared by the first device and the second device.
Public/Granted literature
- US20180040606A1 SYSTEMS AND METHODS FOR PROTECTING A SEMICONDUCTOR DEVICE Public/Granted day:2018-02-08
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