Invention Grant
- Patent Title: Method for manufacturing liquid-discharge-head substrate
-
Application No.: US15012668Application Date: 2016-02-01
-
Publication No.: US10166779B2Publication Date: 2019-01-01
- Inventor: Shiro Sujaku , Keiji Watanabe , Kouji Hasegawa , Junya Hayasaka , Satoshi Ibe
- Applicant: CANON KABUSHIKI KAISHA
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2015-021652 20150205
- Main IPC: B41J2/16
- IPC: B41J2/16 ; H01L23/00 ; G01R1/067 ; H01L21/762 ; B23H9/00

Abstract:
A method for manufacturing a liquid-discharge-head substrate includes providing a substrate having an energy-generating element and a pad, the pad having a wiring layer and a contact-probe receiving section, the contact-probe receiving section having a Vickers hardness that is higher than a Vickers hardness of the wiring layer; bringing a contact probe into contact with the contact-probe receiving section; and performing an electrical inspection by bringing the contact probe into contact with the wiring layer in the pad.
Public/Granted literature
- US20160229183A1 METHOD FOR MANUFACTURING LIQUID-DISCHARGE-HEAD SUBSTRATE Public/Granted day:2016-08-11
Information query
IPC分类: