Invention Grant
- Patent Title: Method of producing SiC single crystal
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Application No.: US13300911Application Date: 2011-11-21
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Publication No.: US10167573B2Publication Date: 2019-01-01
- Inventor: Tadao Nomura , Norio Yamagata , Takehisa Minowa
- Applicant: Tadao Nomura , Norio Yamagata , Takehisa Minowa
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee: SHIN-ETSU CHEMICAL CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2010-263930 20101126; JP2010-263950 20101126
- Main IPC: H01L21/30
- IPC: H01L21/30 ; C30B29/36 ; C30B9/10 ; C30B11/04

Abstract:
A method of producing a SiC single crystal includes: disposing a SiC seed crystal at a bottom part inside a graphite crucible; causing a solution containing Si, C and R (R is at least one selected from the rare earth elements inclusive of Sc and Y) or X (X is at least one selected from the group consisting of Al, Ge, Sn, and transition metals exclusive of Sc and Y) to be present in the crucible; supercooling the solution so as to cause the SiC single crystal to grow on the seed crystal; and adding powdery or granular Si and/or SiC raw material to the solution from above the graphite crucible while keeping the growth of the SiC single crystal.
Public/Granted literature
- US20120132130A1 METHOD OF PRODUCING SiC SINGLE CRYSTAL Public/Granted day:2012-05-31
Information query
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