- Patent Title: Imprint apparatus, imprint method, and article manufacturing method
-
Application No.: US14309960Application Date: 2014-06-20
-
Publication No.: US10168615B2Publication Date: 2019-01-01
- Inventor: Keiji Yamashita , Yutaka Watanabe , Takuya Kono , Masayuki Hatano , Ikuo Yoneda
- Applicant: CANON KABUSHIKI KAISHA , CANON NANOTECHNOLOGIES, INC. , KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP Tokyo US TX Austin JP Tokyo
- Assignee: CANON KABUSHIKI KAISHA,CANON NANOTECHNOLOGIES, INC.,KABUSHIKI KAISHA TOSHIBA
- Current Assignee: CANON KABUSHIKI KAISHA,CANON NANOTECHNOLOGIES, INC.,KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP Tokyo US TX Austin JP Tokyo
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2013-146017 20130712
- Main IPC: G03F7/00
- IPC: G03F7/00 ; B29C43/34 ; B29C43/58 ; B29C31/04 ; B29C43/02

Abstract:
Provided is an imprint apparatus that applies a resin to several locations on a substrate, brings the resin and a mold into contact, and transfers a contoured pattern formed in the mold to the resin, comprising: a controller that sets a principal axis direction according to the contoured pattern and determines the application positions of the resin based on the principal axis direction that has been set such that the distances between resin drops that have been applied so as to be separated in the principal axis direction is larger than the distances between resin drops that have been applied so as to be separated in a direction that is perpendicular to the principal axis direction; and a dispenser that applies the resin based on the application position that has been determined.
Public/Granted literature
- US20150014876A1 IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD Public/Granted day:2015-01-15
Information query