Invention Grant
- Patent Title: Photoresist composition and process of producing photoresist pattern
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Application No.: US14672431Application Date: 2015-03-30
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Publication No.: US10168616B2Publication Date: 2019-01-01
- Inventor: Tatsuro Masuyama , Koji Ichikawa
- Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
- Applicant Address: JP Tokyo
- Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee: SUMITOMO CHEMICAL COMPANY, LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2014-075969 20140402
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/32 ; G03F7/20 ; G03F7/38
Abstract:
A photoresist composition comprising a resin having an acid-labile group and no fluorine atom, a resin having a fluorine atom, and a salt represented by formula (I):
Public/Granted literature
- US20150286137A1 PHOTORESIST COMPOSITION AND PROCESS OF PRODUCING PHOTORESIST PATTERN Public/Granted day:2015-10-08
Information query
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