Invention Grant
- Patent Title: Illumination optical system, exposure apparatus and device manufacturing method
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Application No.: US15390127Application Date: 2016-12-23
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Publication No.: US10168620B2Publication Date: 2019-01-01
- Inventor: Koji Shigematsu
- Applicant: NIKON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: NIKON CORPORATION
- Current Assignee: NIKON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2010-140024 20100619
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B27/09 ; G02B27/28 ; G02B5/30

Abstract:
The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical system; and a phase modulating member which is arranged in the optical path on the illumination target surface side with respect to the polarization converting member and which transmits light from the pupil intensity distribution so as to convert linearly polarized light thereof polarized in a first direction, into required elliptically polarized light and maintain a polarization state of linearly polarized light polarized in a second direction (X-direction or Y-direction) obliquely intersecting with the first direction, in order to reduce influence of retardation caused by a subsequent optical system between the polarization converting member and the illumination target surface.
Public/Granted literature
- US20170108782A1 ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2017-04-20
Information query
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