Invention Grant
- Patent Title: Radiation beam apparatus
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Application No.: US15523938Application Date: 2015-11-10
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Publication No.: US10168621B2Publication Date: 2019-01-01
- Inventor: Jeroen Dekkers , Han-Kwang Nienhuys , Michael Jozef Mathijs Renkens
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP14194518 20141124
- International Application: PCT/EP2015/076179 WO 20151110
- International Announcement: WO2016/083120 WO 20160602
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B5/18 ; G02B26/00

Abstract:
An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
Public/Granted literature
- US20180314164A1 RADIATION BEAM APPARATUS Public/Granted day:2018-11-01
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