Invention Grant
- Patent Title: Circuit design method and system
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Application No.: US15299711Application Date: 2016-10-21
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Publication No.: US10169506B2Publication Date: 2019-01-01
- Inventor: Chung-Hsing Wang , King-Ho Tam , Yen-Pin Chen , Wen-Hao Chen , Chung-Kai Lin , Chih-Hsiang Yao
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Hauptman Ham, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method of designing a circuit includes designing a first layout of the circuit based on a first plurality of corner variation values for an electrical characteristic of a corresponding plurality of back end of line (BEOL) features of the circuit. Based on the layout, a processor calculates a first delay attributable to the plurality of BEOL features and a second delay attributable to a plurality of front end of line (FEOL) devices of the circuit. If the first delay is greater than the second delay, a second layout of the circuit is designed based on a second plurality of corner variation values for the electrical characteristic of the corresponding plurality of BEOL features. Each corner variation value of the first plurality of corner variation values is obtained by multiplying a corresponding corner variation value of the second plurality of corner variation values by a corresponding scaling factor.
Public/Granted literature
- US20170039310A1 CIRCUIT DESIGN METHOD AND SYSTEM Public/Granted day:2017-02-09
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