Method for handling thin brittle films
Abstract:
A method including: providing a structure comprising: a spalled layer having a first side and a second side; and a tape layer provided on the first side of the spalled layer, wherein the tape layer is provided at below a first temperature range; applying a temporary substrate layer to the second side of the spalled layer, wherein the temporary substrate layer is applied at a second temperature range, and wherein at least a portion of the second temperature range is lower than the first temperature range; and after applying the temporary substrate layer, separating the tape layer from the spalled layer.
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