Invention Grant
- Patent Title: Washing device and washing method
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Application No.: US14675567Application Date: 2015-03-31
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Publication No.: US10170344B2Publication Date: 2019-01-01
- Inventor: Tomoatsu Ishibashi
- Applicant: EBARA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: EBARA CORPORATION
- Current Assignee: EBARA CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker & Hostetler LLP
- Priority: JP2014-075712 20140401; JP2015-042868 20150304
- Main IPC: C09D5/16
- IPC: C09D5/16 ; H01L21/67 ; B08B1/00 ; B08B3/02

Abstract:
A washing device includes: a plurality of spindles which holds a substrate and rotates the substrate about a central axis of the substrate as a rotary axis; and a single tube nozzle which discharges a washing liquid toward an upper surface of the substrate, wherein the single tube nozzle discharges the washing liquid so that the washing liquid lands in front of the center of the substrate and the landed washing liquid flows on the upper surface of the substrate toward the center of the substrate. A liquid flow on the upper surface of the substrate after landing of the washing liquid discharged from the single tube nozzle passes through the center of the substrate.
Public/Granted literature
- US20150348806A1 CLEANING APPARATUS AND CLEANING METHOD Public/Granted day:2015-12-03
Information query
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