Invention Grant
- Patent Title: Cavity generation for embedded interconnect bridges utilizing temporary structures
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Application No.: US15197577Application Date: 2016-06-29
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Publication No.: US10170428B2Publication Date: 2019-01-01
- Inventor: Srinivas V. Pietambaram , Rahul N. Manepalli
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwabe, Williamson & Wyatt, P.C.
- Main IPC: H01L23/538
- IPC: H01L23/538 ; H01L23/00 ; H01L23/522 ; H01L25/00 ; H01L25/065 ; H01L23/528

Abstract:
Embodiments are generally directed to cavity generation for an embedded interconnect bridge utilizing a temporary structure. An embodiment of a package includes a substrate; a silicon interconnect bridge including a plurality of interconnections, the interconnect bridge being embedded in the substrate; and a plurality of contacts on a surface of the substrate, the plurality of contacts being coupled with the plurality of interconnections of the interconnect bridge. The interconnect bridge is bonded in a cavity in the substrate, the cavity being formed by removal of at least one temporary structure from the substrate.
Public/Granted literature
- US20180005945A1 Cavity Generation For Embedded Interconnect Bridges Utilizing Temporary Structures Public/Granted day:2018-01-04
Information query
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