Invention Grant
- Patent Title: MIS capacitor
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Application No.: US15822772Application Date: 2017-11-27
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Publication No.: US10170538B2Publication Date: 2019-01-01
- Inventor: Jun Chul Kim , Dong Su Kim , Jong Min Yook
- Applicant: KOREA ELECTRONICS TECHNOLOGY INSTITUTE
- Applicant Address: KR
- Assignee: Korea Electronics Technology Institute
- Current Assignee: Korea Electronics Technology Institute
- Current Assignee Address: KR
- Agency: Mendelsohn Dunleavy, P.C.
- Priority: KR10-2016-0178282 20161223
- Main IPC: H01L29/94
- IPC: H01L29/94 ; H01L49/02 ; H01G4/06

Abstract:
In one embodiment of the present invention, there is provided an MIS capacitor, including: a lower electrode formed with a semiconductor substrate having electrical conductivity and through which an electrical signal passes at a lower surface thereof; an insulating layer formed on the lower electrode; an upper electrode formed on the insulating layer and through which the electrical signal passes at an upper surface thereof; and a first conductive layer formed on side surfaces of the lower electrode so that the electrical signal passing the lower surface and an upper surface of the lower electrode passes along the side surfaces of the lower electrode, wherein the first conductive layer has electro conductivity higher than the electro conductivity of the lower electrode.
Public/Granted literature
- US20180182842A1 MIS CAPACITOR Public/Granted day:2018-06-28
Information query
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