Invention Grant
- Patent Title: Method of fabricating semiconductor optical device and surface-emitting semiconductor laser
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Application No.: US15906515Application Date: 2018-02-27
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Publication No.: US10170890B2Publication Date: 2019-01-01
- Inventor: Yukihiro Tsuji
- Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Applicant Address: JP Osaka
- Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
- Current Assignee Address: JP Osaka
- Agency: Smith, Gambrell & Russell, LLP.
- Priority: JP2017-073938 20170403
- Main IPC: H01S5/183
- IPC: H01S5/183 ; H01S5/042 ; H01S5/02 ; H01S5/125

Abstract:
A surface-emitting semiconductor laser has a semiconductor structure that includes a first side, a second side opposite to the first side, and a side surface that extends from the second side to the first side; a first electrode provided on the first side of the semiconductor structure; and a second electrode provided on the first side of the semiconductor structure. The semiconductor structure also includes a substrate, a first stacked semiconductor layer disposed on the substrate, an active layer disposed on the first stacked semiconductor layer, and a second stacked semiconductor layer disposed on the active layer. The first stacked semiconductor layer includes a first distributed Bragg reflector, and the second stacked semiconductor layer includes a second distributed Bragg reflector. The semiconductor structure side surface has at least an upper surface that is free of chipping.
Public/Granted literature
- US20180287346A1 METHOD OF FABRICATING SEMICONDUCTOR OPTICAL DEVICE AND SURFACE-EMITTING SEMICONDUCTOR LASER Public/Granted day:2018-10-04
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