Invention Grant
- Patent Title: Poly(amic acid) composition and polyimide composition
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Application No.: US15306129Application Date: 2015-04-20
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Publication No.: US10174165B2Publication Date: 2019-01-08
- Inventor: Youhei Inoue , Hiroaki Mori
- Applicant: JFE CHEMICAL CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JFE CHEMICAL CORPORATION
- Current Assignee: JFE CHEMICAL CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2014-090616 20140424
- International Application: PCT/JP2015/002146 WO 20150420
- International Announcement: WO2015/162901 WO 20151029
- Main IPC: C08G73/00
- IPC: C08G73/00 ; C08G73/10 ; B32B15/08 ; B32B15/20 ; B32B27/28 ; C08L79/08 ; H05K1/03 ; C09J7/22 ; C09J7/30 ; C09J7/25

Abstract:
There is provided a polyimide composition that is useful for electronic substrate materials, retains high heat resistance and mechanical strength intrinsic to polyimides, and has a lower dielectric constant and dielectric loss tangent. A polyimide composition for use in electronic substrate materials, containing a polyimide produced by polymerization between a diamine component containing 5-(4-aminophenoxy)-3-[4-(4-aminophenoxy)phenyl]-1,1,3-trimethylindan and an acid component containing 3,3′,4,4′-biphenyltetracarboxylic acid dianhydride.
Public/Granted literature
- US20170044321A1 POLY(AMIC ACID) COMPOSITION AND POLYIMIDE COMPOSITION Public/Granted day:2017-02-16
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