Invention Grant
- Patent Title: Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus
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Application No.: US15024001Application Date: 2013-09-24
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Publication No.: US10174415B2Publication Date: 2019-01-08
- Inventor: Frank Schnappenberger , Anke Hellmich , Thomas Koch , Thomas Deppisch
- Applicant: Frank Schnappenberger , Anke Hellmich , Thomas Koch , Thomas Deppisch
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- International Application: PCT/EP2013/069857 WO 20130924
- International Announcement: WO2015/043622 WO 20150402
- Main IPC: C23C14/00
- IPC: C23C14/00 ; H01J37/32 ; C23C14/54
Abstract:
A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.
Public/Granted literature
- US20160244870A1 METHOD FOR CONTROLLING A GAS SUPPLY AND CONTROLLER Public/Granted day:2016-08-25
Information query
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