Invention Grant
- Patent Title: Plating solution using phosphonium salt
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Application No.: US15560629Application Date: 2016-03-24
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Publication No.: US10174434B2Publication Date: 2019-01-08
- Inventor: Kiyotaka Nakaya , Mami Watanabe
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Priority: JP2015-064067 20150326; JP2016-056773 20160322
- International Application: PCT/JP2016/059424 WO 20160324
- International Announcement: WO2016/152983 WO 20160929
- Main IPC: C23C18/31
- IPC: C23C18/31 ; C23C18/48 ; C25D3/32 ; C25D3/60 ; C07F9/54 ; C25B11/04
Abstract:
A plating solution including a soluble salt containing at least a stannous salt; an acid selected from organic acid and inorganic acid or a salt thereof; and an additive containing phosphonium salt with two or more of aromatic rings is provided.
Public/Granted literature
- US20180051383A1 PLATING SOLUTION USING PHOSPHONIUM SALT Public/Granted day:2018-02-22
Information query
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