Invention Grant
- Patent Title: Reticle and fabrication method thereof, and method for fabricating patterns on a substrate
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Application No.: US15044555Application Date: 2016-02-16
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Publication No.: US10175570B2Publication Date: 2019-01-08
- Inventor: Xiaomin Liu , Long Zhang , Ting Zhou , Poping Shen
- Applicant: Xiamen Tianma Micro-electronics Co., Ltd. , Tianma Micro-electronics Co., Ltd.
- Applicant Address: CN Xiamen CN Shenzhen
- Assignee: XIAMEN TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee: XIAMEN TIANMA MICRO-ELECTRONICS CO., LTD.,TIANMA MICRO-ELECTRONICS CO., LTD.
- Current Assignee Address: CN Xiamen CN Shenzhen
- Agency: Anova Law Group, PLLC
- Priority: CN201510078816 20150213
- Main IPC: G03F1/50
- IPC: G03F1/50 ; H01L21/027 ; G03F1/76 ; G03F7/20 ; G03F7/32
Abstract:
A reticle is provided. The reticle comprises a substrate having at least a first region and a second region; and an organic layer aligned in certain directions by an irradiation of a polarized UV light formed on a surface of the substrate. Wherein the organic layer in the first region has a first polarization direction; the organic layer in the second region has a second polarization direction; and the first polarization direction and the second polarization direction have a predetermined angle.
Public/Granted literature
- US20160238927A1 RETICLE AND FABRICATION METHOD THEREOF, AND METHOD FOR FABRICATING PATTERNS ON A SUBSTRATE Public/Granted day:2016-08-18
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