Invention Grant
- Patent Title: Photosensitive resin composition, method for manufacturing patterned cured film, and electronic component
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Application No.: US14377323Application Date: 2013-02-04
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Publication No.: US10175577B2Publication Date: 2019-01-08
- Inventor: Shingo Tahara , Shigeki Katogi , Hiroshi Matsutani , Kouichi Abe , Akitoshi Tanimoto , Yu Aoki
- Applicant: Hitachi Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee: HITACHI CHEMICAL COMPANY, LTD.
- Current Assignee Address: JP Tokyo
- Agency: Griffin and Szipl PC
- Priority: JPP2012-024007 20120207
- International Application: PCT/JP2013/052479 WO 20130204
- International Announcement: WO2013/118680 WO 20130815
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/40 ; C08L33/06 ; G03F7/023 ; H01L21/02 ; H01L21/311
Abstract:
The invention provides a photosensitive resin composition comprising (A) an alkali-soluble resin having a phenolic hydroxyl group, (B) a compound that generates an acid by light, and (C) an acrylic resin having a group that crosslinks with the component (A), as well as a method for manufacturing a patterned cured film, and an electronic component prepared therewith.
Public/Granted literature
Information query
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