Invention Grant
- Patent Title: Mask, glass substrate and manufacturing method thereof
-
Application No.: US15220586Application Date: 2016-07-27
-
Publication No.: US10175579B2Publication Date: 2019-01-08
- Inventor: Li Chai
- Applicant: Shenzhen China Star Optoelectronics Technology Co., Ltd.
- Applicant Address: CN Shenzhen, Guangdong
- Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
- Current Assignee Address: CN Shenzhen, Guangdong
- Agent Andrew C. Cheng
- Main IPC: H01L21/32
- IPC: H01L21/32 ; G03F7/16 ; G03F1/54 ; C03C15/00 ; G03F1/60 ; G03F7/20

Abstract:
A manufacturing method of a glass substrate is provided, in which a mask including a light-blocking area, a transparent area and a partial-transparent area is adopted. The partial-transparent area protrudes from edges of the light-blocking area to admit some of the UV rays to pass through. In addition, a glass substrate manufactured with the method is also disclosed. By arranging the partial-transparent area on the edges of the light-blocking area, the mask is formed with a slope having a small angle after a lithography process. As such, in an etching process, an edge of a thin film is formed with a slope having a small angle, which contributes to the formation of a second thin film. The thin films are prevented from being fragmented around the slope and the ITO layer is also prevented from fragmented around the periphery of the through hole.
Public/Granted literature
- US20160334708A1 MASK, GLASS SUBSTRATE AND MANUFACTURING METHOD THEREOF Public/Granted day:2016-11-17
Information query
IPC分类: