A monocrystal and polycrystal texturing device includes a device body, various stations arranged in the device body, a transmission device and a control system. The various stations are respectively a dipping acid texturing station, a spray washing station, a drying station, a spray alkali texturing station, a spray washing station, a dipping acid treatment station, a spray washing station, an acid treatment station, a spray washing station and a drying station arranged in sequence. The transmission device is for transmitting a silicon wafer to each station in sequence. The spray alkali texturing station is also connected with a heating device. The control system controls the working status of each station and the heating device. The technology of the present invention has the advantages of stable operation, high efficiency and reliability, and can conduct seamless switching among polycrystal acid texturing, monocrystal alkali texturing, monocrystal acid texturing, and monocrystal alkali texturing.