Invention Grant
- Patent Title: Etching source installable in a storage medium processing tool
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Application No.: US14916081Application Date: 2014-01-17
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Publication No.: US10184170B2Publication Date: 2019-01-22
- Inventor: Samuel Lewis Tanaka , Thomas Larson Greenberg
- Applicant: Seagate Technology LLC
- Applicant Address: US CA Cupertino
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Cupertino
- Agency: Westman, Champlin & Koehler, P.A.
- International Application: PCT/US2014/011981 WO 20140117
- International Announcement: WO2015/108528 WO 20150723
- Main IPC: C23C14/34
- IPC: C23C14/34 ; H01J37/32 ; C23C14/02 ; C23C14/56 ; H01J37/34
Abstract:
A plasma etching source installable into at least one of multiple compartments of a sputter deposition tool. The plasma etching source includes a first mounting plate and at least one electrode plate coupled to the first mounting plate. A gas inlet is included in the first mounting plate of the plasma etching source.
Public/Granted literature
- US20160203956A1 ETCHING SOURCE INSTALLABLE IN A STORAGE MEDIUM PROCESSING TOOL Public/Granted day:2016-07-14
Information query
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