Invention Grant
- Patent Title: Semiconductor apparatus
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Application No.: US15774109Application Date: 2016-10-06
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Publication No.: US10192978B2Publication Date: 2019-01-29
- Inventor: Satoshi Okuda , Akihiko Furukawa , Tsuyoshi Kawakami
- Applicant: Mitsubishi Electric Corporation
- Applicant Address: JP Chiyoda-ku
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-ku
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2016-007858 20160119
- International Application: PCT/JP2016/079734 WO 20161006
- International Announcement: WO2017/126167 WO 20170727
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L29/739 ; H01L27/06 ; H01L29/40

Abstract:
A semiconductor apparatus includes: a p-type base layer provided on a top surface side of an n-type drift layer; an n-type emitter layer provided on a top surface side of the p-type base layer; a first control electrode having a trench gate electrode embedded so as to reach from a surface layer of the n-type emitter layer to the n-type drift layer; a second control electrode having a trench gate electrode embedded so as to reach from the p-type base layer to the n-type drift layer; a p-type collector layer provided on a bottom surface side of the n-type drift layer; and a diode whose anode side and cathode side are connected to the first control electrode and the second control electrodes, respectively. It is possible to improve the controllability of dV/dt by a gate resistor.
Public/Granted literature
- US20180323294A1 SEMICONDUCTOR APPARATUS Public/Granted day:2018-11-08
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